US 12,436,473 B2
Optical element, optical system, lithography system, and method for operating an optical element
Johannes Kimling, Aalen (DE); Peter Graf, Königsbronn (DE); Norbert Wabra, Werneck (DE); Sonja Schneider, Oberkochen (DE); and Reimar Finken, Westhausen (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE)
Filed on Dec. 30, 2022, as Appl. No. 18/148,612.
Application 18/148,612 is a continuation of application No. PCT/EP2021/068161, filed on Jul. 1, 2021.
Claims priority of application No. 102020208415.7 (DE), filed on Jul. 6, 2020.
Prior Publication US 2023/0138850 A1, May 4, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70891 (2013.01) [G03F 7/70316 (2013.01); G03F 7/70958 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An optical element, comprising:
an optical surface having a region; and
a photoresistor configured to have an electrical photoresistance value that depends on an amount of luminous energy incident on the region of the optical surface,
wherein:
the photoresistor is configured to heat the optical element by an amount that depends on the electrical photoresistance value of the photoresistor so that heating the optical element compensates a deformation of the optical element that occurs due to the incident light; and/or
the photoresistor is configured to heat the optical element by an amount that depends on the electrical photoresistance value of the photoresistor so that heating the optical element compensates a change in a refractive index of the optical element that occurs due to the incident light.