US 12,436,470 B2
Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method
Armand Eugene Albert Koolen, Nuth (NL); Simon Gijsbert Josephus Mathijssen, Rosmalen (NL); Hui Quan Lim, Eindhoven (NL); and Amanda Elizabeth Anderson, Valkenswaard (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 18/258,521
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Dec. 9, 2021, PCT No. PCT/EP2021/085058
§ 371(c)(1), (2) Date Jun. 20, 2023,
PCT Pub. No. WO2022/135962, PCT Pub. Date Jun. 30, 2022.
Claims priority of application No. 20216398 (EP), filed on Dec. 22, 2020.
Prior Publication US 2024/0036480 A1, Feb. 1, 2024
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70633 (2013.01) [G03F 7/70625 (2013.01); G03F 7/70641 (2013.01); G03F 7/70683 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method comprising:
illuminating a target with measurement radiation comprising at least a first wavelength to obtain resultant scattered radiation having been scattered by the target, the target comprising a mediator periodic structure and at least a first target periodic structure each formed in a respective different layer on a substrate, a pitch of at least the mediator periodic structure being below a single diffraction limit defined by a collection numerical aperture and a wavelength of the measurement radiation, such that the scattered radiation comprises double diffracted radiation, the double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign;
collecting the scattered radiation within the collection numerical aperture; and
determining a parameter of interest from the scattered radiation.