US 12,436,462 B2
Positive resist composition and pattern forming process
Jun Hatakeyama, Joetsu (JP); Kousuke Ohyama, Joetsu (JP); and Shun Kikuchi, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Nov. 14, 2022, as Appl. No. 17/986,233.
Claims priority of application No. 2021-187306 (JP), filed on Nov. 17, 2021; and application No. 2022-125391 (JP), filed on Aug. 5, 2022.
Prior Publication US 2023/0152696 A1, May 18, 2023
Int. Cl. G03F 7/039 (2006.01); C07C 381/12 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); C08F 220/22 (2006.01); C08F 220/36 (2006.01)
CPC G03F 7/039 (2013.01) [C07C 381/12 (2013.01); C08F 212/24 (2020.02); C08F 220/1806 (2020.02); C08F 220/1807 (2020.02); C08F 220/1808 (2020.02); C08F 220/1811 (2020.02); C08F 220/22 (2013.01); C08F 220/36 (2013.01)] 12 Claims
 
1. A positive resist composition comprising a base polymer end-capped with a suilfonium salt containing a carboxylate anion having a sulfide group linked thereto.