US 12,436,455 B2
Mask information adjusting apparatus, mask data adjusting method, and program
Dai Tsunoda, Kanagawa (JP); and Yasuaki Horima, Kanagawa (JP)
Assigned to NIPPON CONTROL SYSTEM CORPORATION, Tokyo (JP)
Appl. No. 17/913,726
Filed by NIPPON CONTROL SYSTEM CORPORATION, Tokyo (JP)
PCT Filed Mar. 26, 2021, PCT No. PCT/JP2021/012925
§ 371(c)(1), (2) Date Sep. 22, 2022,
PCT Pub. No. WO2021/205906, PCT Pub. Date Oct. 14, 2021.
Claims priority of application No. 2020-069815 (JP), filed on Apr. 8, 2020.
Prior Publication US 2023/0106324 A1, Apr. 6, 2023
Int. Cl. G03F 1/70 (2012.01)
CPC G03F 1/70 (2013.01) 16 Claims
OG exemplary drawing
 
1. A mask information adjusting apparatus for adjusting mask information for use in production of a photomask, comprising:
a subject information acquiring unit that acquires pre-adjustment mask information containing a polygonal mask pattern;
a processing unit that acquires the degree of influence of removal of each vertex or side of the mask pattern, on an exposure pattern that is generated using a photomask corresponding to the mask pattern, in association with the vertex or point, and simplifies the mask pattern by removing each vertex or side according to whether or not a predetermined condition regarding the acquired degree of influence is satisfied; and
an output unit that outputs post-adjustment mask information containing the mask pattern that has been simplified by the processing unit.