US 12,436,454 B2
Pellicle membrane
Paul Janssen, Eindhoven (NL); Maxime Biron, Bromont (CA); Inci Donmez Noyan, Eindhoven (NL); Lourdes Ferre Llin, Geldrop (NL); Adrianus Johannes Maria Giesbers, Vlijmen (NL); Johan Hendrik Klootwijk, Eindhoven (NL); Jan Hendrik Willem Kuntzel, Eindhoven (NL); Arnoud Willem Notenboom, Rosmalen (NL); Anne-Sophie Rollier, Bromont (CA); Ties Wouter Van Der Woord, Eindhoven (NL); and Pieter-Jan Van Zwol, Eindhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/629,849
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Jul. 24, 2020, PCT No. PCT/EP2020/070973
§ 371(c)(1), (2) Date Jan. 25, 2022,
PCT Pub. No. WO2021/018777, PCT Pub. Date Feb. 4, 2021.
Claims priority of application No. 19188979 (EP), filed on Jul. 30, 2019; and application No. 19194571 (EP), filed on Aug. 30, 2019.
Prior Publication US 2022/0269165 A1, Aug. 25, 2022
Int. Cl. G03F 1/64 (2012.01); G03F 7/00 (2006.01)
CPC G03F 1/64 (2013.01) [G03F 7/70033 (2013.01); G03F 7/70983 (2013.01)] 20 Claims
 
1. A method of manufacturing a pellicle membrane, the method comprising:
providing a first sacrificial layer onto a planar substrate to form a stack;
providing, onto at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane; and
providing at least one additional sacrificial layer on the first sacrificial layer prior to providing the at least one pellicle core layer, wherein the at least one additional sacrificial layer is arranged to have controlled stress in the at least one additional sacrificial layer.