| CPC G02B 21/361 (2013.01) [G02B 3/08 (2013.01); G03H 1/0005 (2013.01); G03H 2001/005 (2013.01)] | 19 Claims |

|
1. A flying-over beam pattern scanning hologram microscope device comprising:
a scan beam generation unit which modulates a phase of a first beam split from a light source to convert the first beam to a first spherical wave through a first lens, converts a second beam to a second spherical wave through a second lens, and then allows the first and second spherical waves to interfere with each other to form a scan beam
a scanning unit which comprises a scan mirror for controlling the incident scan beam in a horizontal direction to be transferred to a projection unit, so as to control a scanning position of the scan beam for an object in horizontal and vertical directions, and a translation stage for moving the object in a vertical direction at a rear end of the projection unit;
the projection unit which comprises multiple lens systems and an objective lens, and projects the scan beam transferred from the scanning unit onto an object plane on which the object is placed; and
a light collection unit which detects a beam that has passed through the objective lens again after fluorescing or being reflected from an object,
wherein the scan beam projected onto the object plane has different patterns according to focal position and conical angle conditions of each of the first and second spherical waves formed on the scan mirror, and
wherein the scan beam projected onto the object plane is determined as one of an interference structure between a converging spherical wave and a plane wave on the object plane according to focal position and conical angle conditions of each of the first and second spherical waves formed on the scan mirror, an interference structure between a diverging spherical wave and a plane wave on the object plane, an interference structure between two diverging spherical waves on the object plane, and an Interference structure between a converging spherical wave and a diverging spherical wave on the object plane.
|