| CPC F04D 25/06 (2013.01) [F04D 27/001 (2013.01); G01M 13/00 (2013.01); F05D 2260/80 (2013.01); F05D 2270/335 (2013.01)] | 9 Claims |

|
1. A vacuum pump for performing exhaust for a process chamber in which various processes are performed for a processing target, comprising:
a pump main body including a rotor, a stator, and a motor configured to rotatably drive the rotor; and
a pump controller including a pump monitoring device and configured to drivably control the motor, wherein
the pump monitoring device comprises a control circuit including:
an acquisition section configured to, after a rotation number of a rotor of the vacuum pump has reached a rated rotation number, acquire a physical amount representing an operation state of the vacuum pump over a first period of time to set a waveform of the acquired physical amount as a reference waveform, and over a second period of time later than the first period of time to set an actual measurement waveform of the physical amount;
a comparison section configured to compare the actual measurement waveform of the physical amount with the reference waveform of the physical amount by calculating a difference between a value of the actual measurement waveform and a value of the reference waveform at multiple different corresponding time points only in a difference computing region that is only a part of the actual measurement waveform and the reference waveform to determine a degree of coincidence between the actual measurement waveform and the reference waveform;
a determination section configured to determine an abnormality due to an increase of reactive product in the vacuum pump based on the degree of coincidence determined by the comparison section; and
a notification section to automatically output an indicia of abnormality based on a determination of the determination section.
|