US 12,435,415 B2
Thermal atomic layer deposition of ternary gallium oxide thin films
Adam Hock, Chicago, IL (US); and Michael James Foody, Chicago, IL (US)
Assigned to Illinois Institute of Technology, Chicago, IL (US)
Filed by Illinois Institute of Technology, Chicago, IL (US)
Filed on Nov. 30, 2021, as Appl. No. 17/538,760.
Prior Publication US 2023/0167548 A1, Jun. 1, 2023
Int. Cl. C23C 16/455 (2006.01); C23C 16/40 (2006.01); H01L 21/02 (2006.01)
CPC C23C 16/45527 (2013.01) [C23C 16/40 (2013.01); H01L 21/02194 (2013.01); H01L 21/02205 (2013.01); H01L 21/0228 (2013.01)] 22 Claims
OG exemplary drawing
 
1. A method of a thermal atomic layer deposition (ALD) process of depositing a gallium aluminum oxide thin film, which is (GaxAl1-x)2O3, 0<x<1, the method comprising:
providing a reactive surface coated with hydroxyls;
conducting one or more ALD growth cycles, wherein each of the one or more ALD growth cycles comprises one or more first ALD sub-cycles and one or more second ALD sub-cycles, wherein:
conducting each of the one or more first ALD sub-cycles comprises:
applying a pulse of a first metal precursor to react with the hydroxyls on the reactive surface to form a first monolayer material, wherein the first metal precursor is a gallium compound comprising one or more ligands of a N,N′-diisopropylacetamidinato-group (-amd), a N,N′-diisopropylformamidinato-group (-famd), a N-butyl group (-nBu), a vinyl group (-vinyl), and a guanidinato ligand; and
applying a pulse of an oxygen source after applying the pulse of the first metal precursor to react with the first monolayer material to re-provide a reactive surface coated with hydroxyls; and
conducting each of the one or more second ALD sub-cycles comprises:
applying a pulse of a second metal precursor to react with the hydroxyls on the reactive surface to form a second monolayer material, wherein the second metal precursor is an organic aluminum precursor; and
applying a pulse of an oxygen source after applying the pulse of the second metal precursor to react with the second monolayer material to re-provide a reactive surface coated with hydroxyls.