US 12,435,414 B1
Remote reactant reservoirs for codeposition with variable melt area evaporant flux control
Billy Jack Stanbery, Austin, TX (US); and Walter Seaman, Tucson, AZ (US)
Assigned to HelioSourceTech, LLC, Tucson, AZ (US)
Filed by HelioSourceTech, LLC, Tucson, AZ (US)
Filed on Feb. 22, 2022, as Appl. No. 17/677,837.
Claims priority of provisional application 63/161,043, filed on Mar. 15, 2021.
Int. Cl. C23C 16/44 (2006.01); C23C 14/24 (2006.01); C23C 16/448 (2006.01); C23C 16/52 (2006.01)
CPC C23C 16/4485 (2013.01) [C23C 14/24 (2013.01); C23C 16/52 (2013.01); C23C 14/243 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus, comprising:
a reactant precursor vapor flux control and delivery system located in a vacuum deposition chamber, the reactant precursor vapor flux control and delivery system comprising
a feedstock buffer reservoir,
an evaporation source reservoir remotely mechanically liquid level coupled to the feedstock buffer reservoir, the evaporation source reservoir having a cavity shape that defines an evaporant pool surface area that increases as a function of a fill level of the evaporation source reservoir, and
a liquid reactant precursor located in both the feedstock buffer reservoir and the evaporation source reservoir, wherein a fill level of the liquid reactant precursor in the feedstock buffer reservoir is substantially equal to the fill level of the evaporation source reservoir.