	US 12,435,411 B2
	Metal organonitrile precursors for thin film deposition
Thomas Joseph Knisley, Livonia, MI (US); Bhaskar Jyoti Bhuyan, San Jose, CA (US); Mark Saly, Santa Clara, CA (US); Shalini Tripathi, Detroit, MI (US); Charles H. Winter, Bloomfield Hills, MI (US); and Zachary J. Devereaux, Webberville, MI (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US); and Wayne State University, Detroit, MI (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US); and Wayne State University, Detroit, MI (US)
Filed on May 9, 2023, as Appl. No. 18/195,052.
Claims priority of provisional application 63/451,375, filed on Mar. 10, 2023.
Prior Publication US 2024/0301549 A1, Sep. 12, 2024
Int. Cl. C23C 16/18 (2006.01); C07F 11/00 (2006.01)

CPC C23C 16/18 (2013.01) [C07F 11/005 (2013.01)]

20 Claims

1. A metal coordination complex having a general formula MO₂X₂L₂, where M is a metal selected from molybdenum or tungsten, each X is independently a halogen, each L is independently an organonitrile ligand with the general formula NCR, where R is a C2-C18 group.