| CPC C23C 14/042 (2013.01) [A61N 1/0551 (2013.01)] | 19 Claims |
|
1. A method of making a neural probe, the method comprising:
positioning a first side of a thin film elongate connector on a first side of a first insulation layer, the thin film elongate connector having a second side disposed opposite the first side, the elongate connector extending along the first side of the first insulation layer from a proximal portion of the elongate connector and terminating in a distal end, the distal end positioned along a length of the first insulation layer leaving an exposed portion of the first side of the insulation layer adjacent to the distal end of the elongate connector;
depositing an electrode contact material onto a contact area that includes a portion of the second side of the elongate connector and a portion of the exposed portion of the first side of the first insulation layer, the electrode contact material being deposited onto the contact area via physical vapor deposition such that a thin film electrode contact is formed; and
positioning a first side of a second insulation layer onto the first side of the first insulation layer, wherein the second insulation layer comprises an opening defined in fluidic communication with the electrode contact material deposited onto the contact area.
|
|
9. A method of making a neural probe, the method comprising:
positioning a thin film elongate connector along a length of a first side of a base insulation layer, the thin film elongate connector comprising at least one single-layered trace extending from a main portion of the thin film elongate connector to a distal end portion of the at least one single-layered trace, the at least one single-layered trace having a first side disposed on the first side of the base insulation layer and a second side disposed opposite the first side;
depositing an electrode contact material onto an area comprising a portion of the second side of the distal end portion of the at least one single-layered trace and an adjoining portion of the first side of the base insulation layer via physical vapor deposition; and
positioning a first side of a top insulation layer onto the first side of the base insulation layer, wherein the top insulation layer comprises a contact opening defined in the top insulation layer, wherein the contact opening is in fluidic communication with the electrode contact material such that the electrode contact material is disposed within the contact opening at some depth from a second side of the top insulation layer.
|
|
14. A method of making a neural probe, the method comprising:
positioning a contact portion of a thin film elongate connector on a first side of a middle insulation layer, wherein a first side of the contact portion of the elongate connector is disposed on the first side of the middle insulation layer, wherein the contact portion has a second side disposed opposite the first side, wherein an elongate portion of the elongate connector is disposed on a second side of the middle insulation layer, and wherein the contact portion is electrically coupled to the elongate portion via a transverse portion;
depositing an electrode contact material onto a portion of the second side of the contact portion of the elongate connector and onto an adjoining portion of the first side of the middle insulation layer via physical vapor deposition;
positioning a first side of a top insulation layer onto the first side of the middle insulation layer, wherein the top insulation layer comprises a contact opening defined in the top insulation layer, wherein the contact opening is in fluidic communication with the electrode contact material; and
positioning a first side of a bottom insulation layer onto the second side of the middle insulation layer,
wherein the top insulation layer, the middle insulation layer, and the bottom insulation layer form a body of the neural probe.
|
|
16. A method of making a neural probe, the method comprising:
positioning a first side of a thin film elongate connector on a first side of a first insulation layer, the thin film elongate connector having a second side disposed opposite the first side, the elongate connector extending along the first side of the first insulation layer from a proximal portion to a distal portion of the elongate connector, the first side of the first insulation layer having an exposed surface adjoining the distal portion of the elongate connector;
positioning the first insulation layer and the elongate connector on a support plate;
positioning a mask over the first insulation layer and the elongate connector, the mask comprising a mask opening defined within the mask, the mask opening positioned to leave exposed an area including a portion of the second side of the distal portion of the elongate connector and the exposed surface of the first insulation layer adjoining the distal portion of the elongate connector;
positioning the support plate in a deposition chamber;
depositing an electrode contact material through the mask opening and onto the portion of the second side of the distal portion of the elongate connector and onto the adjoining exposed surface of the first side of the first insulation layer via physical vapor deposition within the deposition chamber such that a thin film electrode contact is formed; and
positioning a first side of a second insulation layer onto the first side of the first insulation layer such that a portion of the thin film electrode contact is disposed between the first insulation layer and the second insulation layer, wherein the second insulation layer comprises an opening defined in fluidic communication with the electrode contact material.
|