	US 12,435,273 B2
	Method for etching at least one surface of a plastic substrate
Frank Bayer, Berlin (DE); Carl Christian Fels, Berlin (DE); Philip Hartmann, Berlin (DE); and Torsten Voss, Berlin (DE)
Assigned to Atotech Deutschland Gmbh & Co. KG, Berlin (DE)
Appl. No. 18/547,343
Filed by Atotech Deutschland Gmbh & Co. KG, Berlin (DE)
PCT Filed Feb. 25, 2022, PCT No. PCT/EP2022/054752 § 371(c)(1), (2) Date Aug. 22, 2023, PCT Pub. No. WO2022/180197, PCT Pub. Date Sep. 1, 2022.
Claims priority of application No. 21159719 (EP), filed on Feb. 26, 2021.
Prior Publication US 2024/0124777 A1, Apr. 18, 2024
Int. Cl. C09K 13/12 (2006.01); C08J 7/14 (2006.01); C09K 13/04 (2006.01); C23C 18/24 (2006.01); C23C 18/16 (2006.01); C23C 18/20 (2006.01); C25D 5/14 (2006.01); C25D 5/56 (2006.01)

CPC C09K 13/12 (2013.01) [C08J 7/14 (2013.01); C09K 13/04 (2013.01); C23C 18/24 (2013.01); C08J 2355/02 (2013.01); C23C 18/1653 (2013.01); C23C 18/2086 (2013.01); C25D 5/14 (2013.01); C25D 5/56 (2013.01)]

15 Claims

1. A method for etching at least one surface of a plastic substrate, the method comprising the steps

(A) providing the substrate,

(B) contacting the substrate with a pre-treatment composition such that a pre-treated substrate is obtained, the pre-treatment composition comprising

(B-a) one or more than one fluorine-free surface-active compound,

and

(C) contacting the pre-treated substrate with an etching composition in an etching compartment such that an etched substrate is obtained, the etching composition comprising

(C-a) one or more than one manganese species,

characterized in that

the pre-treated substrate is not rinsed after step (B) and prior to step (C), and

the etching composition is substantially free of fluorine-containing surface-active compounds.