US 12,435,164 B2
Photocurable composition, coating layer comprising cured product thereof, and substrate for semiconductor process
Sang Hwan Kim, Daejeon (KR); Jung Woo Choi, Daejeon (KR); Ki Seung Seo, Daejeon (KR); Kwang Su Seo, Daejeon (KR); Jun Beom Park, Daejeon (KR); and Won Seup Cho, Daejeon (KR)
Assigned to LG CHEM, LTD., Seoul (KR)
Appl. No. 17/917,101
Filed by LG CHEM, LTD., Seoul (KR)
PCT Filed Jul. 22, 2021, PCT No. PCT/KR2021/009486
§ 371(c)(1), (2) Date Oct. 5, 2022,
PCT Pub. No. WO2022/019677, PCT Pub. Date Jan. 27, 2022.
Claims priority of application No. 10-2020-0091287 (KR), filed on Jul. 22, 2020.
Prior Publication US 2023/0151123 A1, May 18, 2023
Int. Cl. C08F 2/46 (2006.01); C08F 2/50 (2006.01); C08F 220/18 (2006.01); C08F 220/20 (2006.01); C08F 220/30 (2006.01); C08F 222/10 (2006.01); C08G 18/10 (2006.01); C08G 18/24 (2006.01); C08G 18/44 (2006.01); C08G 18/62 (2006.01); C08G 61/04 (2006.01); C08J 7/04 (2020.01); C08J 7/046 (2020.01); H01L 21/683 (2006.01)
CPC C08F 2/50 (2013.01) [C08F 220/1808 (2020.02); C08F 220/1811 (2020.02); C08F 220/20 (2013.01); C08F 220/301 (2020.02); C08F 222/1065 (2020.02); C08G 18/10 (2013.01); C08G 18/246 (2013.01); C08G 18/44 (2013.01); C08G 18/6229 (2013.01); C08J 7/042 (2013.01); C08J 7/046 (2020.01); H01L 21/6836 (2013.01); C08G 2150/00 (2013.01); C08J 2375/14 (2013.01)] 16 Claims
 
1. A photocurable composition comprising:
a urethane (meth)acrylate-based resin syrup comprising a urethane (meth)acrylate-based resin, which is a reaction product of a polyalkylene carbonate-based urethane prepolymer having an isocyanate end group and a reactive group-containing (meth)acrylate-based compound, and a (meth)acrylate-based monomer mixture;
a polyfunctional urethane (meth)acrylate-based compound; and
a polyfunctional (meth)acrylate-based compound,
wherein the urethane (meth)acrylate-based resin comprises a carbonate repeating unit containing a C1-10 alkylene having at least one C1-3 side chain attached thereto, and
wherein the polyfunctional urethane (meth)acrylate-based compound comprises a compound represented by the following Formula 1:

OG Complex Work Unit Chemistry
wherein
R1, R2, and R3 are each independently a C2-10 alkylene,
R4, R5, and R6 are each independently a C2-7 alkylene,
R7, R8, and R9 are each independently hydrogen or a methyl group, and
n, j and k are each independently an integer ranging from 1 to 3.