| CPC C03C 17/00 (2013.01) [C03B 23/023 (2013.01); C03C 15/00 (2013.01); C03C 19/00 (2013.01); H05K 5/03 (2013.01); H10K 59/871 (2023.02); H10H 20/8506 (2025.01); H10K 50/841 (2023.02)] | 6 Claims |

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1. A method of manufacturing a cover window, the method comprising:
preparing glass on a jig and a supporter between the glass and the jig, wherein the glass includes an upper surface comprising a first area and a second area spaced apart from each other in a first direction, and the supporter faces a lower surface of the glass and includes a wax;
supplying a polishing agent including a surfactant to the upper surface of the glass, wherein the polishing agent includes a first polishing agent and a second polishing agent of which particle size is smaller than a particle size of the first polishing agent;
forming a center area by removing at least part of the glass, the center area being arranged between the first area and the second area and extending in the first direction; and
forming a first curved area extending in a curved shape from a first side of the center area to the first area and a second curved area extending in a curved shape from a second side of the center area to the second area, by polishing at least part of the glass,
wherein the second side of the center area is opposite to the first side thereof, and
the first curved area comprises a first partial area concavely extending from the center area and a second partial area convexly extending from the first partial area in a cross-sectional view,
wherein the forming of the center area comprises polishing the upper surface by using a first polishing head to form the center area, which is flat, and
the forming of the first curved area and the second curved area comprises polishing the upper surface by using a second polishing head having a lower hardness than the first polishing head to form the concavely extended first partial area and the convexly extended second partial area, and
wherein the method further comprises removing a scratch formed on the upper surface by polishing the upper surface by using a third polishing head having a lower hardness than the second polishing head,
wherein the supplying of the polishing agent includes supplying the first polishing agent while the second polishing head is used and supplying the second polishing agent while the third polishing head is used.
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