US 12,434,962 B2
Method for fabricating a microfluidic device
Giuseppe Fiorentino, Etterbeek (BE); Aurelie Humbert, Schaarbeek (BE); Simone Severi, Leuven (BE); and Benjamin Jones, Kessel-Lo (BE)
Assigned to IMEC VZW, Leuven (BE)
Filed by IMEC VZW, Leuven (BE)
Filed on Mar. 16, 2021, as Appl. No. 17/203,026.
Claims priority of application No. 20165314 (EP), filed on Mar. 24, 2020.
Prior Publication US 2021/0300752 A1, Sep. 30, 2021
Int. Cl. B81C 1/00 (2006.01)
CPC B81C 1/00071 (2013.01) [B81C 1/00031 (2013.01); B81C 1/00206 (2013.01); B81C 1/00849 (2013.01); B81C 2201/0132 (2013.01); B81C 2201/0159 (2013.01); B81C 2201/0169 (2013.01); B81C 2201/0183 (2013.01); B81C 2201/0198 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A method comprising:
forming a first hydrophilic silicon oxide surface on a first silicon substrate that includes a microfluidic channel;
forming a second hydrophilic silicon oxide surface on a second silicon substrate;
bonding the first hydrophilic silicon oxide surface to the second hydrophilic silicon oxide surface such that the microfluidic channel is partially closed by the second hydrophilic silicon oxide surface; and
removing a portion of the second silicon substrate, thereby forming a fluidic access hole that passes through the second silicon substrate to provide access to the microfluidic channel.