| CPC B23Q 11/143 (2013.01) [B23Q 3/154 (2013.01); B23Q 11/128 (2013.01); H01L 21/6833 (2013.01)] | 20 Claims |
|
1. An electrostatic chuck apparatus comprising:
a base comprising a cooling flow path, the cooling flow path configured to have a refrigerant flow therethrough;
an adiabatic layer on the base;
a uniform heating plate on the adiabatic layer;
a heating element between the adiabatic layer and the uniform heating plate;
an insulating layer on the uniform heating plate, the insulating layer comprising a ceramic;
a conductive layer on the insulating layer, the conductive layer having an area smaller than an area of the insulating layer; and
a dielectric layer on the conductive layer, the dielectric layer comprising a ceramic,
wherein the uniform heating plate has a uniform thickness and comprises a material having different thermal conductivity in a vertical direction and a horizontal direction with respect to a thickness direction of the heating element.
|