US 12,434,257 B2
Film-forming atomizer, film-forming apparatus, and film-forming method
Hiroshi Hashigami, Annaka (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Appl. No. 18/018,746
Filed by SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
PCT Filed Jul. 9, 2021, PCT No. PCT/JP2021/026035
§ 371(c)(1), (2) Date Jan. 30, 2023,
PCT Pub. No. WO2022/030187, PCT Pub. Date Feb. 10, 2022.
Claims priority of application No. 2020-133132 (JP), filed on Aug. 5, 2020.
Prior Publication US 2023/0302482 A1, Sep. 28, 2023
Int. Cl. B05B 17/06 (2006.01); B05B 7/26 (2006.01); B05D 1/02 (2006.01)
CPC B05B 17/0676 (2013.01) [B05B 7/262 (2013.01); B05D 1/02 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A film-forming atomizer configured to atomize a raw material liquid with ultrasonic wave to generate a raw material mist, the atomizer comprising:
a raw material container containing the raw material liquid;
a propagation vessel containing an intermediate liquid as a medium for propagating the ultrasonic wave to the raw material liquid;
a support mechanism configured to support the raw material container so that at least a part of the raw material container is in the intermediate liquid;
a fluid circuit configured to circulate the intermediate liquid;
an ultrasonic wave generator configured to generate and apply the ultrasonic wave to the propagation vessel; and
a degassing mechanism configured to discharge a gas in the intermediate liquid out of the film-forming atomizer; wherein
a draining port for draining the intermediate liquid from the propagation vessel to the fluid circuit is at a position higher than a bottom face of the raw material container; and
an injection port for injecting the intermediate liquid from the fluid circuit to the propagation vessel is at a position lower than a bottom face of the raw material container.