US 12,107,382 B2
Array device manufacturing method, manufacturing apparatus, and storage medium
Ryosuke Kubota, Osaka (JP)
Assigned to SUMITOMO ELECTRIC INDUSTRIES, LTD., Osaka (JP)
Filed by SUMITOMO ELECTRIC INDUSTRIES, LTD., Osaka (JP)
Filed on Oct. 4, 2021, as Appl. No. 17/493,348.
Claims priority of application No. 2020-170765 (JP), filed on Oct. 8, 2020.
Prior Publication US 2022/0115833 A1, Apr. 14, 2022
Int. Cl. H01S 5/02 (2006.01); H01S 5/00 (2006.01); H01S 5/183 (2006.01)
CPC H01S 5/0201 (2013.01) [H01S 5/0042 (2013.01); H01S 5/183 (2013.01)] 9 Claims
OG exemplary drawing
 
1. An array device manufacturing method comprising the steps of:
forming a plurality of optical elements on a wafer;
inspecting the plurality of optical elements;
defining dicing lines on the basis of a result of the inspection such that an array device composed entirely of one or more non-defective ones of the plurality of optical elements is obtained, the one or more non-defective ones being determined to be non-defective in the inspection; and
forming the array device by dicing the wafer along the dicing lines, and
wherein the step of defining dicing lines is a step of defining the dicing lines such that assigning a first array device including more optical elements to a section of the wafer is prioritized over assigning a second array device including less optical elements to a section of the wafer.