| CPC H01L 21/67207 (2013.01) [B65G 47/90 (2013.01); H01L 21/6704 (2013.01); H01L 21/67069 (2013.01); H01L 21/67167 (2013.01); H01L 21/67173 (2013.01); H01L 21/67184 (2013.01); H01L 21/68707 (2013.01)] | 11 Claims |
|
1. A substrate processing device continuously performing wet processing and dry processing on a substrate, comprising
a transportation robot provided in a transportation space; and
a plurality of processing modules adjacent to the transportation space, wherein
each of the plurality of processing modules includes:
a single wet processing unit including a substrate holder holding a substrate and a nozzle discharging a processing solution to a substrate held by the substrate holder, and performing wet processing on a substrate;
a single dry processing unit including a gas supply part having a substrate installation part with a substrate installation surface on which a substrate is disposed and a supply port supplying gas to a substrate, and performing dry processing on a substrate;
a single transfer unit located between the wet processing unit and the dry processing unit and including a hand and a hand driver moving the hand to transfer a substrate between the wet processing unit and the dry processing unit;
a chassis housing the wet processing unit, the dry processing unit, and the transfer unit, wherein
the chassis includes a ceiling part, a floor part, a sidewall, a first inner wall, and a second inner wall,
the first inner wall partitions an inner space of the chassis into a wet processing space including the wet processing unit and a transfer space including the transfer unit,
the second inner wall partitions the inner space of the chassis into the transfer space and a dry processing space including the dry processing unit,
the sidewall partitioning the inner space of the chassis and the transportation space includes a first shutter adjacent to the wet processing space and a second shutter adjacent to the dry processing space, and
the transportation robot is configured to receive and deliver the substrate with the wet processing unit of each of the plurality of processing modules via a first opening of the sidewall formed while the first shutter is opened, and to receive and deliver the substrate with the dry processing unit of each of the plurality of processing modules via a second opening of the sidewall formed while the second shutter is opened.
|