CPC G05B 19/41875 (2013.01) [B29C 64/393 (2017.08); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); G01N 29/14 (2013.01); G01N 29/4472 (2013.01); G01N 2291/0289 (2013.01); G05B 2219/32368 (2013.01); G05B 2219/49023 (2013.01)] | 20 Claims |
1. A method for detecting defects during an additive manufacturing process, the method comprising:
transmitting, by one or more processors of a control system, one or more commands to control creation of a structure by an additive manufacturing device;
capturing, by a plurality of sensors disposed proximate to one or more components of the additive manufacturing device, information associated with acoustic waves generated during one or more controlled operations of the additive manufacturing device;
generating, by the one or more processors, a plurality of signatures based on the information captured by the plurality of sensors, wherein each signature of the plurality of signatures corresponds to a defect or an anomaly that is likely to occur during an additive manufacturing process to be performed by the additive manufacturing device;
receiving, by the one or more processors, sensor data from the plurality of sensors as the additive manufacturing process is performed by the additive manufacturing device, the sensor data including acoustic signal data received from acoustic sensors of the plurality of sensors and non-acoustic sensor data received from non-acoustic sensors of the plurality of sensors;
synchronizing, by the one or more processors, the acoustic signal data with the non-acoustic sensor data to produce synchronized sensor data;
comparing, by the one or more processors, the synchronized sensor data with the plurality of signatures to detect patterns within the synchronized sensor data that are indicative of corresponding defects or anomalies during the additive manufacturing process; and
transmitting, by the one or more processors to the additive manufacturing device, one or more new commands to adjust one or more operational parameters of the additive manufacturing process, based on the detected patterns.
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