US 12,105,430 B2
Exposure apparatus, exposure method, and manufacturing method for product
Yuhei Sumiyoshi, Tochigi (JP)
Assigned to Canon Kabushiki Kaisha, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Nov. 1, 2023, as Appl. No. 18/499,883.
Application 18/499,883 is a continuation of application No. 17/847,037, filed on Jun. 22, 2022, granted, now 11,835,863.
Claims priority of application No. 2021-104157 (JP), filed on Jun. 23, 2021.
Prior Publication US 2024/0077806 A1, Mar. 7, 2024
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/706 (2013.01) [G03F 7/70775 (2013.01)] 17 Claims
OG exemplary drawing
 
1. An exposure apparatus that exposes a substrate to light by using an original in which a pattern is formed, the exposure apparatus comprising:
an illumination optical system arranged to guide illumination light to the original, the illumination light including first illumination light with a first wavelength and second illumination light with a second wavelength different from the first wavelength; and
a projection optical system arranged to form a pattern image of the original by using the illumination light at a plurality of positions in an optical axis direction of the projection optical system, wherein
the illumination optical system is configured to adjust telecentricity of the illumination light based on an inclination amount of the pattern image due to a position deviation between a light condensing position of a light beam with the first wavelength which passed through the projection optical system and a light condensing position of a light beam with the second wavelength which passed through the projection optical system.