US 12,105,428 B2
Image-forming optical system, exposure apparatus, and device producing method
Hideki Komatsuda, Ageo (JP)
Assigned to Nikon Corporation, Tokyo (JP)
Filed by Nikon Corporation, Tokyo (JP)
Filed on Sep. 26, 2022, as Appl. No. 17/953,291.
Application 15/396,629 is a division of application No. 13/511,797, granted, now 9,557,548, issued on Jan. 31, 2017, previously published as PCT/JP2010/070919, filed on Nov. 24, 2010.
Application 17/953,291 is a continuation of application No. 17/103,943, filed on Nov. 24, 2020, granted, now 11,467,501.
Application 17/103,943 is a continuation of application No. 16/293,516, filed on Mar. 5, 2019, granted, now 10,866,522, issued on Dec. 15, 2020.
Application 16/293,516 is a continuation of application No. 15/923,858, filed on Mar. 16, 2018, granted, now 10,228,623, issued on Mar. 12, 2019.
Application 15/923,858 is a continuation of application No. 15/396,629, filed on Dec. 31, 2016, granted, now 9,939,733, issued on Apr. 10, 2018.
Claims priority of application No. 2009-265912 (JP), filed on Nov. 24, 2009.
Prior Publication US 2023/0024028 A1, Jan. 26, 2023
Int. Cl. G03F 7/20 (2006.01); G02B 17/06 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/702 (2013.01) [G02B 17/0657 (2013.01); G03F 7/70033 (2013.01); G03F 7/70091 (2013.01); G03F 7/70233 (2013.01); G03F 7/7025 (2013.01)] 18 Claims
OG exemplary drawing
 
1. An exposure apparatus comprising:
an illumination optical system which includes a fly's eye optical system including a plurality of reflecting elements arranged on an arrangement plane, and which is configured to illuminate a pattern formed on a reflective-type mask arranged on a first plane with a radiation from the fly's eye optical system; and
a projection optical system configured to form an image of the pattern on a substrate arranged on a second plane by using a radiation from the pattern,
wherein an illumination area of the illumination optical system is formed on the first plane at a position deviated from an optical axis of the projection optical system in a first direction;
wherein an entrance pupil of the projection optical system has a size in the first direction and a size in a second direction crossing the first direction, the size in the second direction being larger than the size in the first direction;
wherein a radiation emitted from the illumination optical system so as to travel toward the illumination area is inclined with respect to the optical axis of the projection optical system; and
the radiation from the pattern coming into the projection optical system from the illumination area is inclined with respect to the optical axis of the projection optical system.