US 12,105,420 B2
Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymer
Keisuke Niida, Joetsu (JP); Daisuke Kori, Joetsu (JP); Yasuyuki Yamamoto, Joetsu (JP); Takayoshi Nakahara, Joetsu (JP); and Tsutomu Ogihara, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed on Feb. 24, 2021, as Appl. No. 17/183,989.
Claims priority of application No. 2020-38165 (JP), filed on Mar. 5, 2020.
Prior Publication US 2021/0278766 A1, Sep. 9, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/09 (2006.01); C08G 61/10 (2006.01); C08L 65/00 (2006.01); C09D 165/00 (2006.01); G03F 7/00 (2006.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01)
CPC G03F 7/094 (2013.01) [C08G 61/10 (2013.01); C08L 65/00 (2013.01); C09D 165/00 (2013.01); G03F 7/11 (2013.01); H01L 21/0276 (2013.01); C08G 2261/11 (2013.01); C08G 2261/124 (2013.01); C08G 2261/1414 (2013.01); C08G 2261/1422 (2013.01); C08G 2261/1424 (2013.01); C08G 2261/148 (2013.01); C08G 2261/149 (2013.01); C08G 2261/18 (2013.01); C08G 2261/228 (2013.01); C08G 2261/3142 (2013.01); G03F 7/0002 (2013.01)] 21 Claims
OG exemplary drawing
 
1. A coating-type composition for forming an organic film comprising: a polymer having a partial structure shown by the following general formula (2); and an organic solvent,

OG Complex Work Unit Chemistry
wherein in the formula (2), ring structures Ar1 and Ar2 represent a benzene ring or a naphthalene ring optionally having a substituent, W1 represents an aryl group having 6 to 30 carbon atoms and optionally having a substituent, W2 represents an organic group, the organic group having a structure selected from the group consisting of

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry
W2 is optionally crosslinked to another repeating unit.
 
15. A polymer having a partial structure shown by the following general formula (2),

OG Complex Work Unit Chemistry
wherein in the formula (2), ring structures Ar1 and Ar2 represent a benzene ring or a naphthalene ring optionally having a substituent, W1 represents an aryl group having 6 to 30 carbon atoms and optionally having a substituent, W2 represents an organic group, the organic group having a structure selected from the group consisting of

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry
W2 is optionally crosslinked to another repeating unit.