US 12,105,417 B2
Method of forming a photo-cured layer
Teresa Perez Estrada, Pflugerville, TX (US); and Timothy Brian Stachowiak, Austin, TX (US)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Oct. 5, 2021, as Appl. No. 17/450,009.
Prior Publication US 2023/0103545 A1, Apr. 6, 2023
Int. Cl. G03F 7/00 (2006.01); C08F 20/16 (2006.01); C08F 20/30 (2006.01); C08F 20/68 (2006.01)
CPC G03F 7/0002 (2013.01) [C08F 20/16 (2013.01); C08F 20/30 (2013.01); C08F 20/68 (2013.01)] 21 Claims
OG exemplary drawing
 
1. A method of forming a photo-cured layer on a substrate, comprising:
applying a first photocurable composition directly overlying a first region of the substrate and a second photocurable composition directly overlying a second region of the substrate, wherein the first region is located at a center region of the substrate and the second region is located at an edge region of the substrate and the first region;
contacting the first photocurable composition and the second photocurable composition with a template or superstrate;
photo-curing the first photocurable composition and the second photocurable composition to form the photo-cured layer; and
removing the template or superstrate,
wherein the second photocurable composition has a higher vapor pressure than the first photocurable composition at room temperature.