US 12,105,385 B2
Method for manufacturing a digital display device and digital display device
Michel Sagardoyburu, Neuchâtel (CH); and Simon Springer, Berne (CH)
Assigned to The Swatch Group Research and Development Ltd, Marin (CH)
Filed by The Swatch Group Research and Development Ltd, Marin (CH)
Filed on Oct. 27, 2021, as Appl. No. 17/511,980.
Claims priority of application No. 20216139 (EP), filed on Dec. 21, 2020.
Prior Publication US 2022/0197092 A1, Jun. 23, 2022
Int. Cl. G02F 1/1343 (2006.01); G02F 1/1335 (2006.01); G04B 19/10 (2006.01); G04G 9/06 (2006.01); H10K 50/80 (2023.01)
CPC G02F 1/134309 (2013.01) [G02F 1/133502 (2013.01); G02F 1/13439 (2013.01); G04B 19/10 (2013.01); G04G 9/06 (2013.01); H10K 50/80 (2023.02)] 16 Claims
OG exemplary drawing
 
1. A method for manufacturing a digital display device which comprises an optically active medium disposed between at least one electrode and a corresponding counter-electrode, the optical properties of the optically active medium being modifiable by applying an electric current or voltage between the at least one electrode and the at least one corresponding counter-electrode, the digital display device including a transparent display surface through which at least one piece of information displayed by said digital display device is perceptible, the manufacturing method comprising:
forming at least one first and one second decorative and/or functional pattern directly on the transparent display surface of the digital display device,
wherein the first pattern has a thickness different from that of the second pattern to thereby form reliefs in a height direction of the display device, the reliefs delimit edges and provide volume to a face of the digital display device due to reflections of ambient light,
wherein the first pattern and the second pattern each have a ring shape and are adjacent each other to form the transparent display surface, edges of the reliefs are continuously formed from the first pattern to the second pattern such that the edges of the reliefs extend continuously from an outer side surface of the first pattern to an inner side surface of the adjacent second pattern,
wherein the thickness of the at least one first and second patterns is comprised between 1 μm and 1 mm, and
wherein each of the first pattern and the second pattern have a plurality of thicknesses in the height direction.