US 12,105,034 B2
Single-crystal X-ray structure analysis apparatus, and method therefor
Takashi Sato, Tokyo (JP)
Assigned to Rigaku Corporation, Tokyo (JP)
Filed by Rigaku Corporation, Tokyo (JP)
Filed on Aug. 13, 2023, as Appl. No. 18/448,939.
Application 18/448,939 is a division of application No. 17/295,859, granted, now 11,874,204, previously published as PCT/JP2019/045691, filed on Nov. 21, 2019.
Prior Publication US 2024/0019385 A1, Jan. 18, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G01N 23/20025 (2018.01); G01N 1/28 (2006.01); G01N 23/207 (2018.01)
CPC G01N 23/207 (2013.01) [G01N 1/28 (2013.01); G01N 23/20025 (2013.01)] 6 Claims
OG exemplary drawing
 
1. A single crystal X-ray structure analysis apparatus for performing structure analysis of a substance, comprising:
a structure analysis section that performs a structure analysis of the target material based on diffracted or scattered X-rays detected as X-rays diffracted or scattered by a target material occupying a framework in an X-ray detection measurement step; and a soaking rate or a soaking amount of the target material, which is information acquired in a step for soaking the target material,
wherein an electron density of the target material is recognized by using a result of the structure analysis.