US 12,105,018 B2
Method for measuring optical constants of thin film of fluorine-containing organosilicon compound
Takashi Uchida, Annaka (JP)
Assigned to Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Appl. No. 17/632,035
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
PCT Filed Jul. 30, 2020, PCT No. PCT/JP2020/029192
§ 371(c)(1), (2) Date Feb. 1, 2022,
PCT Pub. No. WO2021/024895, PCT Pub. Date Feb. 11, 2021.
Claims priority of application No. 2019-145856 (JP), filed on Aug. 8, 2019.
Prior Publication US 2022/0276151 A1, Sep. 1, 2022
Int. Cl. G01N 21/21 (2006.01); C08G 65/336 (2006.01); G01B 21/08 (2006.01); G01J 4/04 (2006.01); G01N 21/41 (2006.01); G01Q 60/24 (2010.01)
CPC G01N 21/211 (2013.01) [C08G 65/336 (2013.01); G01B 21/08 (2013.01); G01J 4/04 (2013.01); G01N 21/41 (2013.01); G01Q 60/24 (2013.01)] 5 Claims
OG exemplary drawing
 
1. A method for measuring optical constants of a thin film of a fluorine-containing organosilicon compound, comprising:
a step of forming the thin film of the fluorine-containing organosilicon compound on a base material, the thin film having, as surface roughnesses, an arithmetic mean roughness of smaller than 1.0 nm and a root mean square roughness of smaller than 2.0 nm, a haze value of smaller than 0.3 and a film thickness of 3 to 10 nm; and
a step of measuring the optical constants of the thin film formed on the base material by an ellipsometry method.