CPC C23C 16/45544 (2013.01) [C23C 16/45561 (2013.01); C23C 16/45563 (2013.01)] | 19 Claims |
1. An atomic layer deposition apparatus, comprising:
a fixed gas manifold structure; and
a gas feeding cup removably provided in the fixed gas manifold structure, the gas feeding cup including:
a cup bottom comprising gas feeding channels extending through the cup bottom from a cup bottom outer surface to a cup bottom inner surface on the other side of the cup bottom;
a cup wall surrounding the cup bottom and extending transverse relative to the cup bottom in a direction away from the cup bottom at the inner surface side of the cup bottom such that a gas feeding space is formed by the cup wall and the cup bottom inner surface; and
a gas mixing cone arranged to the gas feeding space, the gas mixing cone is disposed at a distance from the cup bottom inner surface for forming a gas mixing zone between the cup bottom inner surface and the gas mixing cone,
wherein the cup wall extends at least partly in a direction away from the cup bottom at the outer surface side of the cup bottom such that a flange is formed on the opposite side of the cup bottom than the gas feeding space.
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