depositing a first layer of yttrium oxide onto a surface of a chamber component for a processing chamber using a first number of repetitions of an atomic layer deposition process, wherein the first layer has a thickness ranging from two monolayers to about 1 micrometer, wherein the surface of the chamber component comprise aluminum oxide;

depositing a second layer of yttrium fluoride onto the surface of the chamber component using a second number of repetitions of the atomic layer deposition process, wherein the second layer has a thickness ranging from two monolayers to about 1 micrometer; and

annealing the chamber component comprising the first layer and the second layer to cause the first layer and the second layer to interdiffuse to form a homogenous corrosion and erosion resistant coating comprising a YO_xF_y solid state phase of the first layer and the second layer, wherein x and y have values that are based on the first number of repetitions of the atomic layer deposition process that are used to deposit the first layer and the second number of repetitions of the atomic layer deposition process that are used to deposit the second layer;

wherein the chamber component comprises one or more high aspect ratio features, and wherein an interior of the one or more high aspect ratio features are coated with the homogenous corrosion and erosion resistant coating, the high aspect ratio features having an aspect ratio of greater than 50:1.