CPC C02F 1/722 (2013.01) [C02F 1/325 (2013.01); C02F 1/20 (2013.01); C02F 1/42 (2013.01); C02F 1/441 (2013.01); C02F 1/444 (2013.01); C02F 1/4695 (2013.01); C02F 1/66 (2013.01); C02F 2103/04 (2013.01); C02F 2103/346 (2013.01); C02F 2209/001 (2013.01); C02F 2209/003 (2013.01); C02F 2209/20 (2013.01)] | 13 Claims |
1. A water treatment system, comprising:
a source of water for semiconductor manufacturing;
a point of use fluidly connected downstream of the source of water; and
an advanced oxidation process system fluidly connected downstream from the source of water for semiconductor manufacturing, the advanced oxidation process system comprising:
a chemical reactor vessel;
a persulfate addition system fluidly connected to the chemical reactor vessel;
a light emitting device positioned within the chemical reactor vessel; and
a total organic carbon analyzer configured to receive an input signal of a total organic carbon measurement, the total organic carbon analyzer further configured to provide an output signal to control the persulfate addition system in response to the input signal.
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