CPC C02F 1/265 (2013.01) [C02F 1/04 (2013.01); C02F 1/22 (2013.01); C02F 1/683 (2013.01); B01D 11/04 (2013.01); C02F 1/00 (2013.01); C02F 9/00 (2013.01); C02F 2103/08 (2013.01); Y02A 20/124 (2018.01)] | 12 Claims |
1. A system for removing one or more contaminants from water, the system comprising:
a hydrate formation chamber assembly:
a contaminated water diffusion assembly within the hydrate formation chamber assembly, the contaminated water diffusion assembly configured to aerosolize the contaminated water to form aerosolized contaminated water;
a space between a wall of the hydrate formation chamber assembly and the diffusion assembly; and
a guest compound conduit configured to provide a guest compound to within the space and form a hydrate comprising water and the guest compound from the aerosolized contaminated water provided from the contaminated water diffusion assembly.
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