US 12,103,850 B2
Method of forming graphene
Van Luan Nguyen, Suwon-si (KR); Keunwook Shin, Yongin-si (KR); Hyeonjin Shin, Suwon-si (KR); Changhyun Kim, Seoul (KR); Changseok Lee, Gwacheon-si (KR); and Yeonchoo Cho, Seongnam-si (KR)
Assigned to Samsung Electronics Co., Ltd., Gyeonggi-do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Oct. 1, 2020, as Appl. No. 17/060,893.
Claims priority of application No. 10-2019-0159352 (KR), filed on Dec. 3, 2019.
Prior Publication US 2021/0163296 A1, Jun. 3, 2021
Int. Cl. B32B 9/00 (2006.01); C01B 32/186 (2017.01)
CPC C01B 32/186 (2017.08) [Y10T 428/30 (2015.01)] 24 Claims
OG exemplary drawing
 
1. A method of forming graphene, the method comprising:
preparing a substrate in a reaction chamber;
performing a first growth process of growing a plurality of graphene aggregates apart from each other on the substrate at a first growth rate, the first growth process using a reaction gas comprising a carbon source; and
performing a second growth process of forming a graphene layer by growing the plurality of graphene aggregates at a second growth rate slower than the first growth rate, the second growth process using the reaction gas comprising the carbon source,
wherein the plurality of graphene aggregates that are grown in the second growth process are grown on the plurality of graphene aggregates formed in the first growth process.