US 12,103,276 B2
Pattern transfer sheet, method of monitoring pattern transfer printing, and pattern transfer printing system
Amir Noy, Kfar Mordechai (IL); Benny Naveh, Givat Shmuel (IL); Eyal Cohen, Kfar-Saba (IL); Valery Sorin, Jerusalem (IL); and Dor Dror, Ganei Tikva (IL)
Assigned to Wuhan DR Laser Technology Corp, . LTD, Wuhan (CN)
Filed by Wuhan Dr Laser Technology Corp., Ltd., Wuhan (CN)
Filed on Jul. 14, 2022, as Appl. No. 17/864,419.
Claims priority of application No. 202110802980.7 (CN), filed on Jul. 15, 2021; application No. 202121615187.8 (CN), filed on Jul. 15, 2021; application No. 202111034191.X (CN), filed on Sep. 3, 2021; and application No. 202122130645.5 (CN), filed on Sep. 3, 2021.
Prior Publication US 2023/0019668 A1, Jan. 19, 2023
Int. Cl. B32B 27/00 (2006.01); B32B 3/30 (2006.01); B32B 27/08 (2006.01); B32B 7/027 (2019.01)
CPC B32B 27/08 (2013.01) [B32B 3/30 (2013.01); B32B 7/027 (2019.01); B32B 2250/02 (2013.01); B32B 2250/24 (2013.01); B32B 2307/412 (2013.01); B32B 2307/7376 (2023.05)] 14 Claims
OG exemplary drawing
 
1. A pattern transfer sheet comprising:
a plurality of trenches arranged in a specified pattern and configured to receive printing paste and release the printing paste from the trenches upon illumination by a laser beam onto a receiving substrate,
wherein the pattern transfer sheet comprises at least one of:
(i) at least one trace mark that is located outside the specified pattern and is configured to receive the printing paste, wherein the at least one trace mark is aligned with respect to at least one of the trenches and is wider than a width of the laser beam; and
(ii) a plurality of working window marks that are located outside the specified pattern and are configured to receive the printing paste, wherein the working window marks are set at specified offsets with respect to specified trenches of the specified pattern and wherein different working window marks are set at different offsets.