	US 12,103,163 B2
	Control apparatus and control method
Toshimitsu Kai, Tokyo (JP); and Kazuo Hongo, Tokyo (JP)
Assigned to SONY GROUP CORPORATION, Tokyo (JP)
Appl. No. 17/310,041
Filed by SONY GROUP CORPORATION, Tokyo (JP)
PCT Filed Dec. 10, 2019, PCT No. PCT/JP2019/048182 § 371(c)(1), (2) Date Jul. 13, 2021, PCT Pub. No. WO2020/153020, PCT Pub. Date Jul. 30, 2020.
Claims priority of application No. 2019-008409 (JP), filed on Jan. 22, 2019.
Prior Publication US 2022/0088794 A1, Mar. 24, 2022
Int. Cl. B25J 13/08 (2006.01); B25J 15/00 (2006.01); G01N 33/02 (2006.01)

CPC B25J 13/087 (2013.01) [B25J 15/0033 (2013.01); G01N 33/02 (2013.01)]

18 Claims

1. A control apparatus, comprising:

at least one processor configured to:

control a spray of a gas onto a target object;

adjust an amount of the spray of the gas based on a type of the target object;

acquire first odor data of the target object, wherein the first odor data is sensed by an odor sensor subsequent to the spray of the gas;

determine first freshness of the target object based on the first odor data of the target object; and

execute a specific operation for the target object based on the first freshness.