US 11,776,835 B2
Power supply signal conditioning for an electrostatic chuck
Zheng John Ye, Santa Clara, CA (US); Daemian Raj Benjamin Raj, Fremont, CA (US); Rana Howlader, Santa Clara, CA (US); Abhigyan Keshri, Sunnyvale, CA (US); Sanjay G. Kamath, Fremont, CA (US); Dmitry A. Dzilno, Sunnyvale, CA (US); Juan Carlos Rocha-Alvarez, San Carlos, CA (US); Shailendra Srivastava, Fremont, CA (US); Kristopher R. Enslow, San Jose, CA (US); Xinhai Han, Santa Clara, CA (US); Deenesh Padhi, Sunnyvale, CA (US); and Edward P. Hammond, Hillsborough, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Sep. 29, 2020, as Appl. No. 17/36,048.
Prior Publication US 2022/0102179 A1, Mar. 31, 2022
Int. Cl. H01L 21/683 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01)
CPC H01L 21/6833 (2013.01) [H01J 37/32183 (2013.01); H01J 37/32697 (2013.01); H01J 37/32724 (2013.01); H01L 21/67069 (2013.01); H01L 21/67103 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A semiconductor processing system comprising:
a processing chamber;
an electrostatic chuck disposed at least partially within the processing chamber, the electrostatic chuck including at least one electrode and a heater;
a power supply to provide a signal to the at least one electrode to provide electrostatic force to secure a substrate to the electrostatic chuck; and
a filter communicatively coupled between the power supply and the at least one electrode, the filter configured to remove noise introduced by operating the heater, wherein the filter comprises a circuit configured to provide an attenuation of at least 40 dB at a designed frequency from 45 Hz to 65 Hz and to attenuate harmonics of the designated frequency up to about 3 kHz while the electrostatic force on the substrate is maintained.