CPC H01L 21/6833 (2013.01) [H01J 37/32183 (2013.01); H01J 37/32697 (2013.01); H01J 37/32724 (2013.01); H01L 21/67069 (2013.01); H01L 21/67103 (2013.01)] | 20 Claims |
1. A semiconductor processing system comprising:
a processing chamber;
an electrostatic chuck disposed at least partially within the processing chamber, the electrostatic chuck including at least one electrode and a heater;
a power supply to provide a signal to the at least one electrode to provide electrostatic force to secure a substrate to the electrostatic chuck; and
a filter communicatively coupled between the power supply and the at least one electrode, the filter configured to remove noise introduced by operating the heater, wherein the filter comprises a circuit configured to provide an attenuation of at least 40 dB at a designed frequency from 45 Hz to 65 Hz and to attenuate harmonics of the designated frequency up to about 3 kHz while the electrostatic force on the substrate is maintained.
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