CPC H01L 21/68 (2013.01) [H01L 21/68707 (2013.01)] | 17 Claims |
1. A method comprising:
providing a substrate transport apparatus having:
a self-centering end effector, the end effector has wafer holding station with a predetermined center, where the end effector holds a wafer at the wafer holding station and transports the wafer within a substrate processing apparatus, and
at least one center deterministic feature integral to the substrate transport apparatus;
receiving, with a controller, sensor data embodying detection at a predetermined location of at least one edge of the at least one center deterministic feature on the fly, with the substrate transport apparatus in motion within the substrate processing apparatus; and
effecting, with the controller, determination of the predetermined center of the wafer holding station on the end effector from but one pass motion of the at least one center deterministic feature in the substrate processing apparatus past the predetermined location.
|