CPC H01L 21/67276 (2013.01) [G05B 19/41835 (2013.01); G05B 2219/45031 (2013.01); G05B 2219/45212 (2013.01)] | 9 Claims |
1. A control method of an etching machine, comprising:
editing a functional flow of the etching machine by using a host computer;
editing items of the functional flow of the etching machine item by item according to action instruction information configured with a service configuration circuit and used to execute the functional flow of the etching machine;
setting a time interval between adjacent items of the functional flow of the etching machine after editing the items of the functional flow and before storing the edited items;
storing edited items of the functional flow of the etching machine in a functional flow circuit; and
starting the functional flow circuit and causing a control circuit to control a lower level computer to execute the stored items of the functional flow of the etching machine when needed.
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