US 11,776,830 B2
Control system and method of machine and host computer
Xiangwei Dong, Beijing (CN)
Assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
Appl. No. 17/262,652
Filed by BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
PCT Filed Jul. 22, 2019, PCT No. PCT/CN2019/097084
§ 371(c)(1), (2) Date Jan. 22, 2021,
PCT Pub. No. WO2020/029786, PCT Pub. Date Feb. 13, 2020.
Claims priority of application No. 201810908948.5 (CN), filed on Aug. 10, 2018.
Prior Publication US 2022/0277973 A1, Sep. 1, 2022
Int. Cl. H01L 21/67 (2006.01); G05B 19/418 (2006.01)
CPC H01L 21/67276 (2013.01) [G05B 19/41835 (2013.01); G05B 2219/45031 (2013.01); G05B 2219/45212 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A control method of an etching machine, comprising:
editing a functional flow of the etching machine by using a host computer;
editing items of the functional flow of the etching machine item by item according to action instruction information configured with a service configuration circuit and used to execute the functional flow of the etching machine;
setting a time interval between adjacent items of the functional flow of the etching machine after editing the items of the functional flow and before storing the edited items;
storing edited items of the functional flow of the etching machine in a functional flow circuit; and
starting the functional flow circuit and causing a control circuit to control a lower level computer to execute the stored items of the functional flow of the etching machine when needed.