US 11,774,870 B2
Method for removing a particle from a mask system
Sergey Oshemkov, Karmiel (IL); Shao-Chi Wei, Weimar (DE); Joerg Frederik Blumrich, Jena (DE); Martin Voelcker, Koenigsbronn-Zang (DE); and Thomas Franz Karl Scheruebl, Jena (DE)
Assigned to Carl Zeiss SMT GmbH, Oberkochen (DE); and Carl Zeiss SMS Ltd., D.N. Misgav (IL)
Filed by Carl Zeiss SMT GmbH, Oberkochen (DE); and Carl Zeiss SMS Ltd., D.N. Misgav (IL)
Filed on Aug. 8, 2022, as Appl. No. 17/882,948.
Claims priority of application No. 102021120747.9 (DE), filed on Aug. 10, 2021.
Prior Publication US 2023/0053667 A1, Feb. 23, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70925 (2013.01) 24 Claims
OG exemplary drawing
 
1. A method for removing particles from a mask system for a projection exposure apparatus, the mask system comprising a mask and a pellicle, the method comprising:
detecting the particle on the pellicle in the mask system,
providing laser radiation, and
removing the particle by irradiating the particle on the pellicle with the laser radiation,
wherein the wavelength of the laser radiation used by the projection exposure apparatus is also used as the wavelength of the laser radiation for removing the particle on the pellicle.