CPC G03F 7/70925 (2013.01) | 24 Claims |
1. A method for removing particles from a mask system for a projection exposure apparatus, the mask system comprising a mask and a pellicle, the method comprising:
detecting the particle on the pellicle in the mask system,
providing laser radiation, and
removing the particle by irradiating the particle on the pellicle with the laser radiation,
wherein the wavelength of the laser radiation used by the projection exposure apparatus is also used as the wavelength of the laser radiation for removing the particle on the pellicle.
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