US 11,774,868 B2
Image sensor for immersion lithography
Nirupam Banerjee, Eindhoven (NL); Johan Franciscus Maria Beckers, Veldhoven (NL); Peter Brakhage, Dresden (DE); Arend Johannes Donkerbroek, Aarle-Rixtel (NL); Daniel Grimm, Dresden (DE); Tim Rathje, Jena (DE); Martin Tilke, Steina (DE); and Sandro Wricke, Nuenen (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/600,631
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Apr. 7, 2020, PCT No. PCT/EP2020/059859
§ 371(c)(1), (2) Date Oct. 1, 2021,
PCT Pub. No. WO2020/212196, PCT Pub. Date Oct. 22, 2020.
Claims priority of application No. 19169598 (EP), filed on Apr. 16, 2019.
Prior Publication US 2022/0163896 A1, May 26, 2022
Int. Cl. G03F 7/00 (2006.01); C23C 14/34 (2006.01); C23C 14/58 (2006.01); C23C 16/455 (2006.01)
CPC G03F 7/7085 (2013.01) [C23C 14/34 (2013.01); C23C 14/5826 (2013.01); C23C 16/45525 (2013.01); G03F 7/70341 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An image sensor for immersion lithography, the image sensor comprising:
a grating comprising protrusions;
an absorber layer on the grating, the absorber layer configured to absorb radiation; and
a liquidphobic coating at an upper surface of the image sensor;
a protective layer between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid, and
wherein the protective layer has a first thickness perpendicular to a top of the protrusions and a second thickness perpendicular to a side of the protrusions, the first thickness being at least half and at most twice the second thickness.