CPC G03F 7/70516 (2013.01) [G03F 7/70491 (2013.01)] | 16 Claims |
1. A method of determining an updated measure grid in a lithographic system, comprising:
obtaining calibration data relating to one or more calibration substrates;
determining an exposure grid for an exposure location of the lithographic system from the calibration data;
determining a measure grid for a measure location of the lithographic system from the calibration data; and
decomposing the exposure grid and the measure grid so as to remove a calibration substrate dependent component from the measure grid, resulting in the updated measure grid, wherein the calibration substrates have been exposed with partly overlapping fields, enabling the decomposing step that decomposes a stage dependent component and the calibration substrate dependent component from each of the exposure grid and measure grid.
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