US 11,774,861 B2
Calibration method for a lithographic system
Cornelis Melchior Brouwer, Veldhoven (NL); and Chung-Hsun Li, Eindhoven (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/775,802
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Oct. 12, 2020, PCT No. PCT/EP2020/078543
§ 371(c)(1), (2) Date May 10, 2022,
PCT Pub. No. WO2021/094041, PCT Pub. Date May 20, 2021.
Claims priority of application No. 19208249 (EP), filed on Nov. 11, 2019.
Prior Publication US 2022/0390855 A1, Dec. 8, 2022
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70516 (2013.01) [G03F 7/70491 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A method of determining an updated measure grid in a lithographic system, comprising:
obtaining calibration data relating to one or more calibration substrates;
determining an exposure grid for an exposure location of the lithographic system from the calibration data;
determining a measure grid for a measure location of the lithographic system from the calibration data; and
decomposing the exposure grid and the measure grid so as to remove a calibration substrate dependent component from the measure grid, resulting in the updated measure grid, wherein the calibration substrates have been exposed with partly overlapping fields, enabling the decomposing step that decomposes a stage dependent component and the calibration substrate dependent component from each of the exposure grid and measure grid.