US 12,432,967 B2
Semiconductor device and manufacturing method thereof
Yuhki Fujino, Kanazawa Ishikawa (JP); Tsuyoshi Kachi, Kanazawa Ishikawa (JP); Katsura Miyashita, Naka Kanagawa (JP); and Shingo Sato, Kanazawa Ishikawa (JP)
Assigned to Kabushiki Kaisha Toshiba, Kawasaki (JP); and Toshiba Electronic Devices & Storage Corporation, Kawasaki (JP)
Filed by Kabushiki Kaisha Toshiba, Tokyo (JP); and Toshiba Electronic Devices & Storage Corporation, Tokyo (JP)
Filed on Feb. 21, 2023, as Appl. No. 18/112,213.
Claims priority of application No. 2022-150316 (JP), filed on Sep. 21, 2022.
Prior Publication US 2024/0097023 A1, Mar. 21, 2024
Int. Cl. H10D 30/66 (2025.01); H10D 30/01 (2025.01); H10D 64/27 (2025.01)
CPC H10D 30/668 (2025.01) [H10D 30/0297 (2025.01); H10D 64/513 (2025.01)] 14 Claims
OG exemplary drawing
 
1. A semiconductor device comprising:
a semiconductor part including a first semiconductor layer of a first conductivity type and a second semiconductor layer of a second conductivity type in contact with the first semiconductor layer;
a first electrode electrically connected to the first semiconductor layer on a front surface side or a back surface side of the semiconductor part;
a second electrode electrically connected to the second semiconductor layer on the front surface side of the semiconductor part;
a gate electrode facing the second semiconductor layer;
an interlayer insulating film electrically insulating the gate electrode and the second electrode on the front surface side of the semiconductor part; and
a third semiconductor layer of the first conductivity type having: a first region in contact with the second semiconductor layer and the second electrode on the front surface side of the semiconductor part; and a second region provided between the interlayer insulating film and the second electrode in a second direction perpendicular to a first direction that is toward the second electrode from the first semiconductor layer.