| CPC H01L 23/552 (2013.01) [H01L 21/4817 (2013.01); H01L 21/4853 (2013.01); H01L 23/49816 (2013.01); H01L 23/49838 (2013.01); H01L 24/16 (2013.01); H01L 25/162 (2013.01); H01L 25/165 (2013.01); H01L 2224/16225 (2013.01); H01L 2924/16151 (2013.01); H01L 2924/1616 (2013.01); H01L 2924/3025 (2013.01)] | 17 Claims |

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1. A method of making a semiconductor device, comprising:
providing a substrate;
disposing an electrical component over the substrate;
depositing an encapsulant over the electrical component;
disposing a vertical interconnect structure in the encapsulant;
forming a shielding layer over the encapsulant and vertical interconnect structure;
forming a groove in the shielding layer around the vertical interconnect structure, wherein a portion of the shielding layer remains over the vertical interconnect structure as a contact pad;
mounting a semiconductor package to the shielding layer using an adhesive standoff with a spring pin of the semiconductor package contacting the contact pad.
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