US 12,431,341 B2
Apparatus for arcing diagnosis, plasma process equipment including the same, and arcing diagnosis method
Changsoon Lim, Hwaseong-si (KR); Youngdo Kim, Hwaseong-si (KR); Daewon Kang, Seoul (KR); Chansoo Kang, Hwaseong-si (KR); Kyunghyun Kim, Suwon-si (KR); Sangki Nam, Seongnam-si (KR); Kyunjin Lee, Suwon-si (KR); Sungho Jang, Suwon-si (KR); and Jonghun Pi, Gunwi-gun (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Jun. 27, 2022, as Appl. No. 17/850,257.
Claims priority of application No. 10-2021-0132914 (KR), filed on Oct. 7, 2021.
Prior Publication US 2023/0109672 A1, Apr. 13, 2023
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/3299 (2013.01) [H01J 37/32522 (2013.01); H01J 37/32568 (2013.01); H01J 2237/0266 (2013.01); H01J 2237/24507 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/334 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus comprising:
a first voltage-current sensor disposed in a power filter connected to a heater or on a power supply line connected to the heater, the heater being disposed in a lower electrode of a process chamber in which a plasma process is performed and the first voltage-current sensor configured to sense a harmonic generated from a first power supply that supplies alternating current power to the heater and to output a first signal;
an optical sensor disposed on one side of the process chamber and configured to sense an intensity of light generated from the process chamber and to output a second signal;
a second voltage-current sensor disposed on a power supply line connected to an upper electrode of the process chamber, and configured to sense a harmonic generated from a second power supply supplying alternating current power to the upper electrode and to output a third signal; and
an arcing detector circuit configured to determine whether arcing occurs in the process chamber based on at least one of the first signal, the second signal, or the third signal.