US 12,431,334 B2
Gas distribution assembly
Yukihiro Mori, Machida (JP); Vincent Hubert Bernard Gilles Babin, Tama (JP); and Naoto Tsuji, Tokyo (JP)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on Feb. 9, 2021, as Appl. No. 17/171,793.
Claims priority of provisional application 62/976,287, filed on Feb. 13, 2020.
Prior Publication US 2021/0254216 A1, Aug. 19, 2021
Int. Cl. H01J 37/32 (2006.01); C23C 16/455 (2006.01)
CPC H01J 37/32449 (2013.01) [C23C 16/45536 (2013.01); C23C 16/45565 (2013.01); C23C 16/45582 (2013.01); C23C 16/45585 (2013.01); H01J 37/32091 (2013.01); H01J 37/32513 (2013.01); H01J 37/32568 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A gas distribution assembly for distributing a gas to a reaction chamber comprising:
a gas manifold,
a gas channel below the gas manifold,
a shower plate assembly below the gas channel and in fluid communication with the gas manifold, wherein the shower plate assembly comprises a thickness between an upper surface of the shower plate assembly and a lower surface of the shower plate assembly, wherein the thickness of the shower plate assembly is greater at a center of the shower plate assembly than an edge of the shower plate assembly, wherein a plurality of apertures extend from the upper surface of the shower plate assembly to the lower surface of the shower plate assembly and
one or more adjustable gap devices interposed between and mechanically coupled to the gas channel and the shower plate assembly;
wherein a gap is formed between a lower surface of the gas channel and the upper surface of the shower plate assembly;
wherein the shower plate assembly comprises a perimeter region coupled to the one or more adjustable gap devices exterior of the gap, and an inclined region underlying the gas channel and the gas manifold; and
wherein the one or more adjustable gap devices are configured to move the gas channel relative to the shower plate assembly, thereby adjusting the size of the gap.