US 12,431,329 B2
Method of assembling drift tube assemblies in ion implantors
Aaron P. Webb, Austin, TX (US); Krag R. Senior, Austin, TX (US); Chris Czajka, Dripping Springs, TX (US); Charles T. Carlson, Cedar Park, TX (US); and Jason M. Schaller, Austin, TX (US)
Assigned to Applied Materials, Inc.
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jun. 15, 2023, as Appl. No. 18/210,524.
Prior Publication US 2024/0420919 A1, Dec. 19, 2024
Int. Cl. H01J 37/30 (2006.01); H01J 37/317 (2006.01); H05H 9/04 (2006.01)
CPC H01J 37/3007 (2013.01) [H01J 37/3171 (2013.01); H05H 9/042 (2013.01); H01J 2237/08 (2013.01); H05H 2277/12 (2013.01)] 21 Claims
OG exemplary drawing
 
1. An ion implantation system comprising:
an ion source for generating an ion beam;
an end station for holding a substrate to be implanted by the ion beam; and
a linear accelerator disposed between the ion source and the end station and adapted to accelerate the ion beam, the linear accelerator comprising at least one acceleration stage including a resonator coil coupled to a drift tube assembly, the drift tube assembly comprising:
a first drift tube coupled to a first end of a first insulting rod via interference fit;
a second drift tube coupled to a first end of a second insulting rod via interference fit; and
a mounting bracket coupled to a second end of the first insulting rod and to a second end of the second insulting rod via interference fit.