US 12,431,256 B2
System and method for generating a focused x-ray beam
Benjamin Donald Stripe, Berkeley, CA (US); Wenbing Yun, Walnut Creek, CA (US); Janos Kirz, Berkeley, CA (US); Thomas James Smart, Oakland, CA (US); Mark Antoine Cordier, El Sobrante, CA (US); and Sylvia Jia Yun Lewis, San Francisco, CA (US)
Assigned to Sigray, Inc., Benicia, CA (US)
Filed by Sigray, Inc., Concord, CA (US)
Filed on Feb. 13, 2025, as Appl. No. 19/052,937.
Claims priority of provisional application 63/554,062, filed on Feb. 15, 2024.
Prior Publication US 2025/0266184 A1, Aug. 21, 2025
Int. Cl. G21K 1/06 (2006.01); G21K 1/02 (2006.01)
CPC G21K 1/02 (2013.01) 20 Claims
OG exemplary drawing
 
1. An apparatus comprising:
at least one x-ray source configured to generate x-rays;
at least one capillary x-ray focusing optic configured to receive and focus at least some of the generated x-rays into a focused x-ray beam; and
at least one x-ray optical component configured to receive the generated x-rays and/or the focused x-ray beam such that a focus size δ1 of the focused x-ray beam is smaller than a focus size δ0 of the focused x-ray beam without the at least one x-ray optical component.