US 12,429,724 B2
Array substrate having splicing display region and virtual sub-pixel and method for manufacturing same, and liquid crystal panel
Yang Ge, Beijing (CN); Yu Zhao, Beijing (CN); Yong Zhang, Beijing (CN); Jian Wang, Beijing (CN); Xian Wang, Beijing (CN); Jianwei Ma, Beijing (CN); Lei Shi, Beijing (CN); XingXing Guan, Beijing (CN); Yashuai An, Beijing (CN); Tianyang Han, Beijing (CN); and Xiuliang Wang, Beijing (CN)
Assigned to Beijing BOE Optoelectronics Technology Co., Ltd., Beijing (CN); BOE Technology Group Co., Ltd., Beijing (CN); and Shandong Lanbeisite Educational Equipment Group, Shandong (CN)
Appl. No. 18/554,971
Filed by Beijing BOE Optoelectronics Technology Co., Ltd., Beijing (CN); BOE Technology Group Co., Ltd., Beijing (CN); and SHANDONG LANBEISITE EDUCATIONAL EQUIPMENT GROUP, Shandong (CN)
PCT Filed Feb. 10, 2023, PCT No. PCT/CN2023/075467
§ 371(c)(1), (2) Date Oct. 11, 2023,
PCT Pub. No. WO2023/160410, PCT Pub. Date Aug. 31, 2023.
Claims priority of application No. 202210191789.8 (CN), filed on Feb. 28, 2022.
Prior Publication US 2024/0210747 A1, Jun. 27, 2024
Int. Cl. G02F 1/1333 (2006.01); G02F 1/1337 (2006.01)
CPC G02F 1/13336 (2013.01) [G02F 1/133388 (2021.01); G02F 1/1337 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A method for manufacturing an array substrate, the array substrate having a display region and a non-display region disposed on a periphery of the display region,
the method comprising:
successively forming a plurality of stacked patterned film layer structures on a substrate;
wherein the plurality of patterned film layer structures are configured to form a plurality of sub-pixels, the plurality of sub-pixels comprising a plurality of first sub-pixels within the display region and a plurality of virtual sub-pixels within the non-display region;
wherein area of an orthographic projection of a pixel electrode of the virtual sub-pixel on the substrate is greater than an area of an orthographic projection of a pixel electrode of the first sub-pixel on the substrate, the display region comprises a plurality of normal display regions arranged in arrays and a first splicing display region between adjacent two of the normal display regions;
wherein forming each of the patterned film layer structures comprises:
forming a whole-layered film layer structure on the substrate;
forming a photoresist film on the film layer structure and successively performing an exposure operation on portions, within the plurality of normal display regions, of the photoresist film by using a mask plate; and
forming the patterned film layer structure on the substrate by developing the exposed photoresist film and etching the whole-layered film layer structure;
wherein performing the exposure operation on the portion, within one of the plurality of normal display regions, of the photoresist film comprises:
forming a first exposure region within a first normal display region and a target splicing display region by using a first mask of the mask plate, and forming a second exposure region within the non-display region and the target splicing display region by using a second mask of the mask plate; and
moving the mask plate along a direction toward the second normal display region until the first mask covers the second normal display region and the second exposure region that is within the target splicing display region and the second mask covers the first exposure region within the target splicing display region;
wherein the first normal display region is any one of the plurality of normal display regions, the second normal display region is a normal display region adjacent to the first normal display region, and the target splicing display region is a first splicing display region between the first normal display region and the second normal display region.