CPC G03F 7/0955 (2013.01) [C08F 212/08 (2013.01); C08F 220/281 (2020.02); C08F 220/382 (2020.02); G03F 7/0045 (2013.01); G03F 7/165 (2013.01); G03F 7/168 (2013.01); G03F 7/34 (2013.01)] | 39 Claims |
1. A method of forming a structure, said method comprising:
applying an acid-generating composition on a substrate surface, or on one or more intermediate layers optionally present on said substrate surface, said acid-generating composition comprising a polymer including recurring monomers comprising an acid-generating group;
heating said acid-generating composition to form an acid-generating layer having an average thickness of between 2 nm and 5 nm;
applying an acid-sensitive composition on said acid-generating layer, said acid-sensitive composition comprising less than about 0.5% by weight total of acids, photoacid generators, and thermal acid generators, based upon the total weight of the composition taken as 100% by weight;
heating said acid-sensitive composition to form an acid-sensitive layer; and
exposing at least a portion of said acid-sensitive layer to radiation.
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