US 11,768,435 B2
Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces
Jinhua Dai, Rolla, MO (US); Joyce A. Lowes, Rosebud, MO (US); and Carissa Jones, Springfield, MO (US)
Assigned to Brewer Science, Inc., Rolla, MO (US)
Filed by Brewer Science, Inc., Rolla, MO (US)
Filed on Nov. 1, 2019, as Appl. No. 16/671,426.
Claims priority of provisional application 62/754,837, filed on Nov. 2, 2018.
Prior Publication US 2020/0142308 A1, May 7, 2020
Int. Cl. G03F 7/004 (2006.01); G03F 7/095 (2006.01); C08F 212/08 (2006.01); C08F 220/28 (2006.01); G03F 7/34 (2006.01); G03F 7/16 (2006.01); C08F 220/38 (2006.01)
CPC G03F 7/0955 (2013.01) [C08F 212/08 (2013.01); C08F 220/281 (2020.02); C08F 220/382 (2020.02); G03F 7/0045 (2013.01); G03F 7/165 (2013.01); G03F 7/168 (2013.01); G03F 7/34 (2013.01)] 39 Claims
OG exemplary drawing
 
1. A method of forming a structure, said method comprising:
applying an acid-generating composition on a substrate surface, or on one or more intermediate layers optionally present on said substrate surface, said acid-generating composition comprising a polymer including recurring monomers comprising an acid-generating group;
heating said acid-generating composition to form an acid-generating layer having an average thickness of between 2 nm and 5 nm;
applying an acid-sensitive composition on said acid-generating layer, said acid-sensitive composition comprising less than about 0.5% by weight total of acids, photoacid generators, and thermal acid generators, based upon the total weight of the composition taken as 100% by weight;
heating said acid-sensitive composition to form an acid-sensitive layer; and
exposing at least a portion of said acid-sensitive layer to radiation.