US 12,426,440 B2
Method for preparing pixel define layer
Jun Ki Kim, Cheonan-si (KR); Changmin Lee, Cheonan-si (KR); Yeon Soo Lee, Cheonan-si (KR); Jun Bae, Cheonan-si (KR); Hanwook Seo, Cheonan-si (KR); Seo Jeong Jeon, Cheonan-si (KR); Soung Yun Mun, Cheonan-si (KR); and Kyung Soo Kim, Cheonan-si (KR)
Assigned to DUK SAN NEOLUX CO., LTD., Cheonan-si (KR)
Filed by DUK SAN NEOLUX CO., LTD., Cheonan-si (KR)
Filed on Aug. 31, 2023, as Appl. No. 18/240,477.
Claims priority of application No. 10-2022-0115733 (KR), filed on Sep. 14, 2022.
Prior Publication US 2024/0107801 A1, Mar. 28, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. H10K 59/12 (2023.01); H10K 59/122 (2023.01); H10K 71/40 (2023.01); H10K 85/10 (2023.01)
CPC H10K 59/1201 (2023.02) [H10K 59/122 (2023.02); H10K 71/40 (2023.02); H10K 85/111 (2023.02)] 14 Claims
OG exemplary drawing
 
1. A method for preparing a pixel defining layer comprising application and coating; pre-baking; exposure to light; developing; and
post-baking of a photosensitive composition, which comprises a cardo-based binder resin of Formula 1; a reactive unsaturated compound; a photoinitiator having a molar absorption coefficient of 10,000 (L/mol cm) or more in the region of 330 nm to 380 nm; and a solvent,
wherein the post-baking step is performed at the oven temperature of 250° C. to 270° C. for 60 to 120 minutes, and the amount of moisture generated after the post-baking is 50 ppm or less:

OG Complex Work Unit Chemistry
wherein
1) R1 and R2 are each independently hydrogen; deuterium; a halogen; a C6-30 aryl group; a C2-30 heterocyclic group including at least one heteroatom among O, N, S, Si, and P; a fused ring group of a C6-30 aliphatic ring and a C6-30 aromatic ring; a C1-20 alkyl group; a C2-20 alkenyl group; a C2-20 alkynyl group; a C1-20 alkoxy group; a C6-30 aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-20 alkoxycarbonyl group,
2) R1 and R2 may form a ring with a neighboring group(s),
3) m and n are each independently an integer of 0 to 4,
4) A1 and A2 are each independently Formula 2 or Formula 3:

OG Complex Work Unit Chemistry
in Formula 2 and Formula 3,
4-1) * represents a binding part,
4-2) R3 to R6 are each independently hydrogen; deuterium; a halogen; a C6-30 aryl group; a C2-30 heterocyclic group including at least one heteroatom among O, N, S, Si, and P; a fused ring group of a C6-30 aliphatic ring and a C6-30 aromatic ring; a C1-20 alkyl group; a C2-20 alkenyl group; a C2-20 alkynyl group; a C1-20 alkoxy group; a C6-30 aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-20 alkoxycarbonyl group,
4-3) R3 to R6 may form a ring with a neighboring group(s),
4-4) Y1 and Y2 are each independently Formula 6 or Formula 7:

OG Complex Work Unit Chemistry
in Formula 6 and Formula 7,
4-4-1) * represents a binding position,
4-4-2) R9 is hydrogen or methyl,
4-4-3) R10 to R13 are each independently hydrogen; deuterium; a halogen; a C6-30 aryl group; a C2-30 heterocyclic group including at least one heteroatom among O, N, S, Si, and P; a fused ring group of a C6-30 aliphatic ring and a C6-30 aromatic ring; a C1-20 alkyl group; a C2-20 alkenyl group; a C2-20 alkynyl group; a C1-20 alkoxy group; a C6-30 aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-20 alkoxycarbonyl group,
4-4-4) L1 to L3 are each independently a single bond, a fluorenylene group; C2-30 alkylene; C6-30 arylene; a C2-30 heterocyclic ring; C1-30 alkoxylene, C2-30 alkyleneoxy; C6-30 aryloxy; or C2-30 polyethyleneoxy,
4-4-5) q and r are each independently an integer of 0 to 3 with the proviso that q+r=3, and
5) the ratio of Formula 2 and Formula 3 in the polymer chain of the resin including a repeating unit represented by Formula 1 above is 9:1 to 1:9,
6) X1 is a single bond; O; CO; SO2; CR′R″; SiR′R″; Formula 4; or Formula 5,
6-1) R′ and R″ are each independently hydrogen; deuterium; a halogen; a C6-30 aryl group; a C2-30 heterocyclic group including at least one heteroatom among O, N, S, Si, and P; a fused ring group of a C6-30 aliphatic ring and a C6-30 aromatic ring; a C1-20 alkyl group; a C2-20 alkenyl group; a C2-20 alkynyl group; a C1-20 alkoxy group; a C6-30 aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-20 alkoxycarbonyl group, 6-2) R′ and R″ may form a ring with a neighboring group(s),

OG Complex Work Unit Chemistry
in Formula 4 and Formula 5,
6-3) * represents a binding position,
6-4) R7 and R8 are each independently hydrogen; deuterium; a halogen; a C6-30 aryl group; a C2-30 heterocyclic group including at least one heteroatom among O, N, S, Si, and P; a fused ring group of a C6-30 aliphatic ring and a C6-30 aromatic ring; a C1-20 alkyl group; a C2-20 alkenyl group; a C2-20 alkynyl group; a C1-20 alkoxy group; a C6-30 aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-20 alkoxycarbonyl group,
6-5) o and p are each independently an integer of 0 to 4,
7) X2 is a C6-30 aryl group; a C2-30 heterocyclic group including at least one heteroatom among O, N, S, Si, and P; a fused ring group of a C6-30 aliphatic ring and a C6-30 aromatic ring; a C1-20 alkyl group; a C2-20 alkenyl group; a C2-20 alkynyl group; a C1-20 alkoxy group; a C6-30 aryloxy group; a fluorenylene group; a carbonyl group; an ether group; or a C1-20 alkoxycarbonyl group, and
8) the R′, R″, X2, L1 to L3, R1 to R8, and R10 to R13 may each be further substituted with one or more substituents selected from the group consisting of deuterium; a halogen; a silane group substituted or unsubstituted with a C1-30 alkyl group or C6-30 aryl group; a siloxane group; a boron group; a germanium group; a cyano group; an amino group; a nitro group; a C1-30 alkylthio group; a C1-30 alkoxy group; a C6-30 arylalkoxy group; a C1-30 alkyl group; a C2-30 alkenyl group; a C2-30 alkynyl group; a C6-30 aryl group; a C6-30 aryl group substituted with deuterium; a fluorenyl group; a C2-30 heterocyclic group including at least one heteroatom among O, N, S, Si, and P; a C3-30 alicyclic group; a C7-30 arylalkyl group; a C8-30 arylalkenyl group; and a combination thereof; or may form a ring between the neighboring substituents.