| CPC H10H 20/824 (2025.01) [H10H 20/013 (2025.01); H10H 20/857 (2025.01); H10H 29/142 (2025.01)] | 20 Claims |

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1. A semiconductor device, comprising:
a semiconductor structure including a first semiconductor layer having a first material, a second semiconductor layer, an active region between the first semiconductor layer and the second semiconductor layer;
a first metal element-containing structure located on the semiconductor structure and comprising a first metal element; and
a layer having a second material and a second metal element, located between the first semiconductor layer and the first metal element-containing structure;
wherein the first material has a conduction band edge Ec and a valence band edge Ev, and the second material has a work function WF1, when the first semiconductor layer is of an n-type conductivity, the work function WF1 fulfills WF1<(Ec+Ev)/2, and when the first semiconductor layer is of a p-type conductivity, the work function WF1 fulfills WF1>(Ec+Ev)/2.
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